RT-2201, RT-2500, RT-3000 Sheet Resistance Metrology Systems

Semilab’s new generation sheet resistance measurement systems combine four-point probe (4PP) with non-contact measurement techniques in a variety of platforms from the cost-effective, low automation platform (WT) to full SEMI standard compliant platforms (RT). In addition to the more conventional 4PP, non-contact measurement can be applied to BEOL (metal layers thickness) using EDDY or to FEOL (implant monitoring) using JPV.

Features and System specifications:

  • Wafer handling: Robot up to 300 mm
  • Inspected area: Full sheet wafers
  • Probes: 4PP (FEOL & BEOL) , EDDY (BEOL) , JPV (FEOL)
  • 1-4 permanent 4PP heads for different ranges & applications, Lower CoO
  • Cleanroom class: class 1 minienvironment
Specification RT-2201 RT-2500 RT-3000
Wafer Size up to 200 mm 150/200 mm or 200/300 mm 200/300 mm
Loading options 2 open cassettes up to 200 mm
  • FOUP for 300 mm wafers
  • FOSB for 300 mm wafers
  • Open cassette for 200 mm wafers (with adapter)
Double FOUP platform
Automation software SECS/GEM communication option SECS/GEM communication option Fully automated software
Factory automation

Not available

Not available, designed for mid-range fabs Yes, specifically designed for high volume facilities with full factory automation, OHT option

It is possible to integrate all of the following measurement techniques into one mapping instrument:

  • Eddy current technique for thin layers' sheet resistance measurements
  • Junction Photovoltage measurement for sheet resistance mapping
  • Ion Implant Monitoring

RT product line is designed to meet SEMI standards.

Request Info

Technology