EIR-2200 Enhanced Infrared Reflectometer
The EIR-2200 is a unique automated epi thickness measurement system with infrared spectroscopic reflectometer for high throughput epi thickness measurement. Fully compliant to the relevant SEMI / CE standards. The EIR product line is based on smart, reliable electronics, which improves equipment uptime and decreases maintenance needs.
Applications
- Interferogram measurements:
- Si EPI thickness measurement
- Reflection measurement:
- Si, SiC, SOI thickness measurement of full sheet wafers
- Allows more complex analysis of materials: Transition zone and higher dopant concentration measurement of Si, SiC samples, oxid thickness in SOI samples
- Dielectric composition and thickness measurement: PSG, BSG
Features and System Specifications
| EIR-2200 | |
|---|---|
| Spectral range | 7500-450 cm-1 |
| Angle of incidence | 12° |
| Spot size | 1-4 mm |
| Edge exclusion | <1.5 mm |
| Resolution | 1-32 cm-1 |
| Loadport | 1 open cassette or 1 SMIF |
| Sample sizes | 4-8” or 8” only |
| Substrate materials | Si, SiC |
| Edge grip | Non-edge grip |
| FFU | optional |
Options
- BPSG and FSG application options
- SECS compatibility option
- Signal tower with 4 colors
- Ionizer